Why is microwave plasma CVD considered the most ideal method for diamond deposition?

First, let"s look at the technical principle of microwave plasma CVD method: the operation principle of MPCVD equipment is to excite the deposition gas into a plasma state under the action of microwave energy. Under the action of the electromagnetic field generated by microwave, the electrons in the cavity collide with each other and produce violent oscillation, which promotes the collision between other atoms, groups and molecules in the resonant cavity, so as to effectively improve the ionization degree of reaction gas, Until glow power generation is reached, higher density plasma is produced. In the reaction process, the ionization degree of the feed gas reaches more than 10%, which makes the cavity full of supersaturated atomic hydrogen and carbon containing groups, which effectively improves the deposition rate and the deposition quality of diamond.

Generally speaking, MPCVD method is to find a diamond as a substrate, put it in a sealed equipment, and inject some hydrogen, nitrogen, methane, etc., in which the carbon element will be attached to the diamond, and the original diamond will continue to grow. Eat gas, grow diamonds!

Secondly, let"s take a look at the advantages of MPCVD method: the preparation of diamond by MPCVD method has many advantages. For example, there is no electrode in the reaction process, and there will be no pollution caused by the evaporation and dissociation of metal wire to the deposited diamond surface in HFCVD method; In DC plasma jet CVD, the thermal shock caused by ignition and extinction is very easy to cause the diamond to fall off from the surface of the substrate; The plasma excited by microwave has high ionization density, so MPCVD method is the best way to mass produce high-quality diamond among many CVD methods.