What are the commonalities of MPCVD equipment in the process of depositing diamond film?

MPCVD equipment has the following commonalities in the process of depositing diamond film:

1. Carbon source. Including various carbonaceous compounds and even graphite, such as alkane, hydrocarbon, alkene, alkynol, ketone, Co, CO2 and CF4;

2. Hydrogen. This is the main gas to inhibit the nucleation, growth and etching of symbiotic graphite;

3. Proper hydrocarbon ratio. The C / H ratio in the air source is generally below 10%;

4. Appropriate substrate temperature. In addition to the particularity of low-temperature deposition, the substrate temperature is generally limited to the range of 700 ℃ - 1200 ℃;

5. Low working pressure. Generally less than one atmospheric pressure.

6. Gas activation technology. At least one (or several) gas activation technology should be used to excite carbon source and hydrogen to produce diamond film deposition atmosphere with active carbon containing groups and atomic hydrogen.