What are the basic structures of MPCVD equipment?

The basic structure of MPCVD equipment includes control unit, microwave unit, water cooling unit, vacuum unit, etc. The cavity is evacuated through the vacuum unit to ensure the low vacuum state required for diamond growth. Then, the flow rate and chamber pressure of each gas path are controlled by the control unit, and the reaction gas source (CH4, H2, AR, O2, N2, etc.) is introduced into the chamber and controlled under a certain chamber pressure. After the air flow is stable, the microwave is generated through the microwave unit, and the microwave is introduced into the cavity by the waveguide. Under the action of microwave field, the reaction gas is changed into plasma state to form a plasma ball suspended above the diamond substrate, and the substrate is heated to a certain temperature by using the high temperature of plasma. The excess heat generated in the cavity is conducted out by the water cooling unit.

During the MPCVD growth of single crystal diamond, the optimal growth conditions are ensured by adjusting the power, gas source composition and cavity pressure. In addition, the plasma ball has no contact with the cavity wall, which ensures that there is no impurity particles in the diamond growth process and improves the quality of diamond.